Semiconductor Processing

• Plasma Monitoring
• Thickness Measurement

Ocean Optics offers metrology products, spectrometers and accessories for a wide range of semiconductor processing and thin film metrology applications, including materials analysis, plasma monitoring and film thickness measurements. Users can select from fully integrated metrology systems; modular components that are configured into custom setups; and OEM spectrometers and sub-systems that are integrated into other devices for high-volume needs.

Thanks to their small size and great flexibility, miniature UV-VIS and VIS-NIR spectrometers are useful for work in the lab, on the line or at the QC station. Setups can be configured for endpoint detection, optical substrate characterization, plasma etching, surface cleaning analysis and measurement of solutions used in cleaning and etching metals.

Plasma Monitoring
Modular spectroscopy components are excellent tools for acquiring plasma emission spectra in real time from a plasma chamber. Plasma characteristics determined from these emission spectra can be used for monitoring and controlling plasma-based processes.

Thickness Measurement
Ocean Optics offers both modular and fully integrated systems for determining optical and non-optical thin film thickness characteristics for applications in semiconductor, industrial, medical and consumer markets.

Applications:

Modular spectroscopy components are excellent tools for acquiring plasma emission spectra in real time from a plasma chamber. Plasma characteristics determined from these emission spectra can be used for monitoring and controlling plasma-based processes.

Ocean Optics offers both modular and fully integrated systems for determining optical and non-optical thin film thickness characteristics for applications in semiconductor, industrial, medical and consumer markets.